[mems-talk] Stress values of various films

[Raj Kumar]

Dear Friends
    We are in the process of validating our film stress data. Can anybody
suggest us the typical stress range of the following films.


Dep. Method   	Film Type    	Thick.      Dep. Temp.
LPCVD 		Polysilicon 	20000 A     620 Deg. C
PECVD 		Nitride		10000 A     400 Deg. C
LPCVD 		Nitide 		1500 A      770 Deg. C
LTO		PSG 		8000 A      420 Deg. C
PECVD 		Oxide  		20000 A     400 Deg. C
DC sputtred 	Aluminium 	6000 A      220 Deg. C


Sincerely yours 

   RAJKUMAR
SCL, India
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