[mems-talk] Stress values of various films

[Dave Kharas]

Hi Raj,
the 620C 2um poly recipe will most likely give you
a highly compressive poly several Hundred MPa in 
value. For Low stress Poly you will need to grow
it at 580-600C closer to the amorphous-crystalline 
phase transition temperature. The unit cell volume
change during the as-growth phase transformation will
give you a low tensile stress film.

cheers

Dave Kharas Ph.D.
Sarcon Microsystems
dave_kharas at yahoo.com

> Dear Friends
    We are in the process of validating our film
stress data. Can 
anybody
suggest us the typical stress range of the following
films.


Dep. Method   	Film Type    	Thick.      Dep. Temp.
LPCVD 		Polysilicon 	20000 A     620 Deg. C
PECVD 		Nitride		10000 A     400 Deg. C
LPCVD 		Nitide 		1500 A      770 Deg. C
LTO		PSG 		8000 A      420 Deg. C
PECVD 		Oxide  		20000 A     400 Deg. C
DC sputtred 	Aluminium 	6000 A      220 Deg. C


Sincerely yours 

   RAJKUMAR
SCL, India


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