[mems-talk] Ti Etch

[kin at astri.org]

Try H2O2 at 40oC-50oC. It takes arround 0.5-1 hour to etch.
It will not attack Al.

> 
> Dear all,
> 
> I am trying to etch Ti(300 Angs),which has aluminum
> layer underneath it.I have used TiW-30 (25-40C)from
> transene.I could see that after some time the Ti etch
> rate reduces completely and etch almost stops.I think
> due to the formation of Tio2 the etch rate drops.
> 
> Can anyone suggest me a good Titanium etchant that
> should not attack Al.
> 
> Your suggestions are highly helpful.
> Thanks
> Kris
> 
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Best Regards,
Kin