Jeehwan, HF etches Ti. -Michael Martin >>> "Jeehwan Kim" <jhkim03 at ucla.edu> 08/03/06 4:26 PM >>> Hi Oliver, I deposite 200nm Pt on Si with 50A Ti adhesion layer via e-beam evaporator and then put that into HF solution. Pt was removed (peeled off) after several minute. Is that difference coming from machine we used?