[mems-talk] Carbon Sputtered Films

[Kirt Williams]

For sputtered graphite (carbon), the best etchant I've tested is a silicon 
isotropic etchant, based on HNO3 and NH4F (which together generate HF).
See "Etch Rates for Micromachining Processing, Part II" in JMEMS, Dec. 2003.
    --Kirt Williams

----- Original Message ----- 
From: "Sreemanth M Uppuluri" <sreemanth at hotmail.com>
To: <mems-talk at memsnet.org>
Sent: Tuesday, August 01, 2006 5:50 AM
Subject: [mems-talk] Carbon Sputtered Films

> Hello All,
>
> I have sputtered carbon films on my substrates and now I am trying to 
> remove them. I tried solvent clean but it doesn't seem to work very well. 
> Do you have suggestions?