[mems-talk] silicon nitridation poser
K Saw
K.Saw at mail.aip.org.au
Tue Aug 8 21:00:54 EDT 2006
Dear Bhat,
Thanks for your comments. I read in a journal that one way is to use SiCl4 + NH3. Any chance of using SiF4 + NH3?
Regards,
Kim
---------- Original Message ----------------------------------
From: VS Bhat <vsbhat at sitarindia.com>
Reply-To: General MEMS discussion <mems-talk at memsnet.org>
Date: Sat, 5 Aug 2006 15:38:40 +0530
>Kim,
>May be, you could try CVD to deposit the film
>bhat
> Quoting Glenn Silveira <glenn at noeltech.com>:
>
>> Kim,
>> Fluorine is not used to make SiN it is used to clean the chamber. PECVD
>> amorphous silicon recipe with nitrogen or ammonia should do the trick.
>>
>> P.S. A target index of refraction at 632nm will help if you need to have
>> someone make this for you.
>
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