[mems-talk] How to remove the PMMA etching residue.

Tue Aug 15 21:52:58 EDT 2006

You can try SF6 and CHF3 mixture etching of SiO2, say a gas ratio of 50 sccm CHF3
and 5 sccm SF6.

&#212;&#218;&#196;&#250;&#181;&#196;&#192;&#180;&#208;&#197;&#214;&#208;&#212;&#248;&#190;&#173;&#204;&#225;&#181;&#189;:
>From: "Xiaojing Zou" <Xiaojing_Zou at brown.edu>
>Reply-To: General MEMS discussion <mems-talk at memsnet.org>
>To: "General MEMS discussion" <mems-talk at memsnet.org>
>Subject: [mems-talk] How to remove the PMMA etching residue.
>Date:Tue, 15 Aug 2006 17:35:39 -0400
>
>Hi:
> 
>     I did some CF4 and CHF3 etching SiO2 using PMMA as mask. But I found that
there is alway something left around the etched SiO2.  Does anybody have these
kinda experience about removal of these stuff ?? (It cannot be removed by
acetone)
> 