[mems-talk] How to remove the PMMA etching residue.

[Scott McWilliams]

Hi Xiaojing, are you using CF4 and CHF3 without oxygen mixed in?  I have had 
difficult to remove polymers form using both CF4 and CHF3 while etching 
SiO2.  Can you reduce the selectivity to the PMMA a little bit and add some 
oxygen to the etch?  I have also had some success using Shipley PRX solution 
to remove the etch residue.  PRX does etch SiO2 very slowly but didn't 
matter on my application.

Good Luck,

Scott
----- Original Message ----- 
From: "Xiaojing Zou" <Xiaojing_Zou at brown.edu>
To: "General MEMS discussion" <mems-talk at memsnet.org>
Sent: Tuesday, August 15, 2006 4:35 PM
Subject: [mems-talk] How to remove the PMMA etching residue.


> Hi:
>
>    I did some CF4 and CHF3 etching SiO2 using PMMA as mask. But I found 
> that there is alway something left around the etched SiO2.  Does anybody 
> have these kinda experience about removal of these stuff ?? (It cannot be 
> removed by acetone)