[mems-talk] Quartz wet etching

[bobhendu at aol.com]

Depending upon the photoresist you probably have reflowed and filled in what was your developed pattern with photoresist thus preventing the HF from etching the quartz. You probably want to reduce your hard bake time after develop to what is recommended by the resist vendor you use. They provide excellent documentation for superior results. Bob Henderson 
 
 
-----Original Message-----
From: KORTESEB at libero.it
To: mems-talk at memsnet.org
Sent: Thu, 14 Dec 2006 9:10 AM
Subject: [mems-talk] Quartz wet etching


Dear all
I'm wet etching quartz with a BHF solution 6:1, but I have encounterd some 
difficulties in etching.
What I do is a photolithographic process on the quartz substrate, a hardbake of 
4 hours at 180° and then the wet etching process.
What I obtain though is the rearrangement of the photoresist in a disordered 
pattern and no etching!
Has anyone an idea where I go wrong?
Barbara
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe: 
http://mail.mems-exchange.org/mailman/listinfo/mems-talk
________________________________________________________________________
Check out the new AOL.  Most comprehensive set of free safety and security tools, free access to millions of high-quality videos from across the web, free AOL Mail and more.