[mems-talk] about lithography

Rajib Ahmed rajib at ece.rochester.edu
Sat Dec 23 17:00:32 EST 2006


Explain your problem a bit more eloquently.  Your email doesn't seem to 
elucidate on the problem that you are experiencing.

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Rajib Ahmed
347 Hopeman Engineering Building
Department of Electrical and Computer Engineering
University of Rochester
Rochester, NY 14627-0167
Email:rajib at ece.rochester.edu
Phone#:(585)224-6538
Fax#:(585)273-4919
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On Sat, 23 Dec 2006, abhaya joshi wrote:

> hi guyes,
> i am having a problem.
> i am doign lithography on surface, which is having 20um deep cavities. i
> have to put photoresist on that.but while doing lithography the photoresist
> at corner (at top surface).
> i am using positive resist S1813 and spinning at speed of 3000RPM.
> can anybody tell me what is the problem?
> -abhay joshi
> university of pune.


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