[mems-talk] TMAH ETCHING OF NICKEL

[is_bajpayee]

Dear friends

I have a peculiar problem of etching of Silicon using TMAH without at all affecting the patterned Nickel on oxide.
Nickel ( thermally evoporated for thickness of 800A) is patterened with PR and lithography on the SiO2/si, etching of  the exopsed Si using TMAH  ( 10%wt, 80C) has to carried out. Now i would like to know that how the Nickel film will be affected by this solution and what will be the characteristics of the the etching. i tried the same with KOH  at room tempearture and there is negligible etching of nickel for a long time.

any suggestions will be highly appreciated. 

thank you