[mems-talk] Array patternig over porous silicon

[mir ic]

Hi
 
I am doing a project that make array pattern over porous silicon.
My coating device is "spin coat".
Which photoresist is suggested to have uniformity?
For array pattering what can I do?
 
Other method:
Can I nitride the silicon at first and patterned it then etch nitride layer and at last etch Si to make porous silicon. Is it possible?
 
Thank you about your concern
Morteza