[mems-talk] Anisotropic Wet Etching of Silicon nitride

[ess26 at runbox.com]

Hi Bob,

Thanks for the reply. The thing is that I would like to minimize the ions bombardment damage from RIE to etch under a very "delicate" material.

Ed
 
> It would be much easier to plasma etch silicon nitride anisotropically. I don't know of a masking material that would hold up to 180 degree C. Phosphoric Acid bath. Bob Henderson