AW: [mems-talk] Silicon oxide etch

[Michael Prömpers]

hi andrea,

kirt williams already gave the answer, but here is also my recommendation,
how i did it last times. do you want to etch slow or fast? in any case you
need an HF-based etchant...there is no other way...

=> try e.g. AF91, which is a 10% buffered HF-solution with a wet etch-rate
of about 60nm/min in case of SiO2, or use simply a 1%HF-solution (ca.
6nm/min). 


please give some feedback about the results. 


cheers,
michael


> -----Ursprüngliche Nachricht-----
> Von: mems-talk-bounces at memsnet.org 
> [mailto:mems-talk-bounces at memsnet.org] Im Auftrag von Andrea Mazzolari
> Gesendet: Mittwoch, 29. November 2006 18:05
> An: 'General MEMS discussion'
> Betreff: [mems-talk] Silicon oxide etch
> 
> Hi all,
> I need to etch silicon oxide using a silicon nitride mask. 
> Any suggestion
> about a wet etchant which will etch only silicon oxide 
> preserving silicon
> nitride?