[mems-talk] Photoresist with smooth and high resolution sidewall

[Hsiu-Jen Wang]

Isaac,

    Yes, the ripples on the sidewall actually made roughness. I used
AZ 9260, and tried post expose bake but haven't taken SEM, so I'm not
sure how it goes. By the way, I also would like to know sidewall of AZ
9260 in 4.7um thickness still be vertical? Or what photoresist should
I use for this thickness. Vertical and smooth sidewall are the most
important issues in my experiment. Thanks.

Regard,

Alton

On 9/29/06, Isaac Chan <iwchan at venus.uwaterloo.ca> wrote:
> Alton,
>
> Are you talking about the ripples on the sidewall caused by standing wave
> interference pattern, or the line edge roughness seen from the top due to
> the resist's molecular roughing/photomask pattern roughness?
>
> Regards,
> Isaac