[mems-talk] photoresist peeled off together with PDMS

[Mike Pinelis]

Bob, 

I have successfully used Fluid 230 from Dow Corning to solve this
problem -- it basically acts as a release layer to make sure that PDMS
does not stick to the resist.  You can spin Fluid 230 onto your
photoresist pattern and then spin or pour PDMS. 

Good luck, 

Mike

Mike Pinelis
Ph.D. Candidate
University of Michigan
http://www.wimserc.org
http://www.memsinvestorjournal.com




-----Original Message-----
From: mems-talk-bounces at memsnet.org
[mailto:mems-talk-bounces at memsnet.org] On Behalf Of Bo Bob Huo
Sent: Thursday, October 05, 2006 12:43 PM
To: mems-talk at memsnet.org
Subject: [mems-talk] photoresist peeled off together with PDMS

Recently I was confused by a problem. When I peeled off PDMS from
the master coated photoresist of shipley 1818, the photoresist was
always peeled off together with PDMS. Before curing PDMS, the
master had been exposed to a vapor of the chemical of chlorinated
silane to facilitate easy removal of PDMS. Can anyone give me a
help? Thanks in advance.

-/Bob