[mems-talk] photoresist peeled off together with PDMS

[Mike Pinelis]

Bob, 

I've successfully used Fluid 230 from Dow Corning in this situation --
just spin it onto your resist before pouring/spinning PDMS.  

Also, if adhesion of the resist to the wafer is a problem, you may want
to use AS 300 adhesion promoter from Silicon Resources.  Another good
adhesion promoter is Onmicoat. 

Mike

Mike Pinelis
Ph.D. Candidate
University of Michigan
http://www.wimserc.org
http://www.eecs.umich.edu/maharbiz
http://www.memsinvestorjournal.com



-----Original Message-----
From: mems-talk-bounces at memsnet.org
[mailto:mems-talk-bounces at memsnet.org] On Behalf Of Bo Bob Huo
Sent: Friday, October 13, 2006 1:51 PM
To: mems-talk at memsnet.org
Subject: [mems-talk] photoresist peeled off together with PDMS 

Dear all,

Thanks for the suggestions given by some guys. I put a droplet of
chlorinated silane near the wafer in vaccum jar but the PDMS was
still peeled off together with phtoresist. All the chemicals were
newly purchased and in good state.

Overdeveloping may cause this problem? Does anyone encounter this
problem? And how do you solve it? Thanks.