[mems-talk] Problem about Al sputtering

[Gary]

Aluminum is usually sputter with a dc magnetron. Gary

Gary Hillman
Service Support Specialties, Inc.
9 Mars Court
PO Box 365
Montville, NJ 07045
973-263-0640
973-263-8888. 



-----Original Message-----
From:	Qiao Dayong [SMTP:dyqiao at nwpu.edu.cn]
Sent:	Monday, October 16, 2006 9:58 AM
To:	mems-talk at memsnet.org
Subject:	[mems-talk] Problem about Al sputtering

Dear MEMS community,
    I am using a RF magnetron sputtering system to deposit Al and Cu film on
silicon substrate. The recipe is:
Ar flow rate: 80 sccm
RF power: 150 Watt
Base pressure:3e-3Pa
Pocess pressure: 0.8Pa
The Cu can be successfully deposited, but there is no Al deposited on the silicon
substrate after 30 min sputtering. Would anyone give me an reasonable explanation
or any suggestion or some tricks about that? Thanks in advance.