[mems-talk] Wet etching SiN with photoresist

[Scott McWilliams]

Hi CJ, I think most people use phosphoric acid for SiN etching, BOE works 
well for PECVD SiN but not thermal nitride.

Regards,

Scott
----- Original Message ----- 
From: "??? Chun-Jung Su" <cjsu.ee91g at nctu.edu.tw>
To: <mems-talk at memsnet.org>
Sent: Saturday, October 28, 2006 12:53 PM
Subject: [mems-talk] Wet etching SiN with photoresist


> Dear all,
>
> I am trying to etch 1000A-thick SiN with photoresist. I have used B.O.E. 
> to
> etch the SiN formed by our LPCVD system, but the etching rate is quite 
> low,
> i.e. 12 A/ min. Is there any other chemical solution to accomplish this 
> job?