[mems-talk] Metal mask for DRIE

[Xiaoguang "Leo" Liu]

Hi Nik
I'm doing a wafer etch through of 550um. The minimum feature size is 80um.
Thanks
Best
Leo

On 9/1/06, Nicolas Duarte <nbd110 at psu.edu> wrote:
> Metal is generally not advised for DRIE since very often the metal
> gets sputtered off and creates micro masks in your open area
> resulting in grass.  My only suggestion would be to try a different
> photoresist or  shorten your hard bake of your AZ9260.
>
> What aspect ratios are you looking for and what is your minimum feature size?