[mems-talk] Dry etch selectivity between Al and PMMA

[Michael D Martin]

Zou,
   The particulars of the power are dependant on the electrode geometry,
i.e. assuming a capacitive reactor diameters and spacing of the
electrodes. 

-Mike Martin 
 U. of Louisville


>>> "Xiaojing Zou" <Xiaojing_Zou at brown.edu> 09/22/06 6:14 PM >>>
Thanks a lot for your information.

Since you have experience in this case, I'd like to ask more about the 
etching process. What is the RF power do you use ???
I found some group use 300-500 W high power, while others use 25W.   Do
you 
know what is the difference between them???