[mems-talk] Controlling evaporated metal roughness

[Michael D Martin]

Hi John! Hope BU is treating you well.  I would use the thermal deposition and raise the background pressure a bit. Try introducing some argon.  Your surface roughness will increase with pressure.  

-Mike 
 U. of Louisville

>>> <henson at bu.edu> 4/19/2007 10:55 AM >>>
We'd like to deposit ~50nm Al layers with controlled surface 
roughnesses ranging from ~5nm Rms to above 10nm Rms. I'm using a Sharon 
e-beam evaporator system for the deposition but also have access to an 
Edwards Thermal evaporator. The greater Rms roughness the better. Any 
ideas?
Thanks,
John Henson
Boston University