[mems-talk] Lift-off process

[Yue Mun Pun, Jeffrey]

Hi,
I am attempting a lift-off technique to pattern gold.  I have patterned 7-8um of AZ9260 on SiO2 wafers and evaporated 10nm Chromium followed by 300nm Gold through the patterns in the AZ9260 resist.  Subsequently I have lifted off most of the resist by soaking the wafers in Acetone over 2 days.  However I have noticed that there are some resist residue that won't be lift-off even after sonication.  The sonication process also leaves a lot of debris on the wafer.
I am trying to remove these debris and the remaining residue by soaking the wafers overnight in AZ300T Stripper.  Does anyone have an alternative technique to suggest to clean the wafers?  I have tried using H2SO4:H2O2 = 3:1 (piranha) by it may damage by structures, so I refrain from using this technique.
 
Thanks a bunch!
 
Jeffrey