[mems-talk] Removing oxidised resist from gold surfaces

[Yue Mun Pun, Jeffrey]

Hi,
Due to the long time taken for Acetone at 70-80'C used to remove AZ9260 resist via lift-off, I have attempted to use Piranha (H2SO4:H2O2 = 3:1) to remove some small amounts of resist remaining on my wafer surface which has gold conductors patterned on it.  
However, after the Piranha treatment, I observed water-like droplets remaining on the gold conductors, which I think are solubulized resist that have been oxidized by the Piranha and stained on the gold surfaces.  The SiO2 surface remains clean.  
Can anyone tell me how I can remove these 'resist droplets', which have stained on the gold condutors?

Mr. Jeffrey Mun Pun YUE
余文彬
Division of Bioengineering
E3A-07-02, Nanobioanalytics Lab
7 Engineering Drive 1
National University of Singapore
Singapore 117574
Tel: (65) 65166482, Fax: (65) 68723069
E-mail:  g0500396 at nus.edu.sg
Website:  http://www.bioeng.nus.edu.sg/people/trau/Lab_index.htm
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