[mems-talk] Techniques for Dopant Profiling in Si
Thomas Wolff (WEP)
thomas.wolff at wepcontrol.com
Thu Aug 30 11:05:51 EDT 2007
Did you check the Electrochemical CV on Silicon yourself? We use it in our
lab for Silicon with
good success. ECV the benefit, that semiconductor structures with rough
surface in the micron-
range can be profiled. To my experience SR as well as SIMS have problems
with the profiling of
samples with rough surface.
_________________________________________________________
mailto:thomas.wolff at wepcontrol.com <mailto:thomas.wolff at wepcontrol.com> ·
Tel +49-7723-9197-27
WEP
Bregstrasse 90
D-78120 Furtwangen
http://www.wepcontrol.com <http://www.wepcontrol.com/>
More information about the MEMS-talk
mailing list