Hi I am trying to etch LPCVD deposited and boron doped by diffusion (10^17 to 10^19) layer. This layer has a thickness of 0.5 um and sitting on top of LPCVD grown ~ 2um thick silicon nitride layer. Can anyone help me with this? Any references or ideas will be appreciated. Thank you. Mukti M Rana The University of Texas at Arlington