[mems-talk] Low Stress Si3N4 in LPCVD

[王孝忠]

Hi all

    I need to deposite 0.3um LP Si3N4 on <100> Si wafer which is low 
stress(<300MPa) and Particle-free. I have search a lot of papers on internet 
.. The only way to get low stress Si3N4 is increasing DCS/NH3 ratio , but 
particle contamination is getting worse. Is there anyone can share 
informations about how to deposite low stress Si3N4 in LPCVD without 
particle contamination.

Thanks in advance.
Wang