[mems-talk] Removal of post-lift-off resist residue

[Pradeep Dixit]

One simple solution is to use O2 plasma for short time to remove these
residue.

Thanks,
Pradeep


On 2/27/07, Yue Mun Pun, Jeffrey <g0500396 at nus.edu.sg> wrote:
>
> Hi,
> I have patterned some gold heaters using lift-off process with AZ5214E
> resist.  The lift-off was done using AZ5214E resist.  However, I noticed
> plenty of tiny resist residue remaining on the wafer after the lift-off
> process, which cannot be removed using further acetone wash nor ultrasonic
> power.  Can anyone tell me how I can remove this residue to result in a
> clean wafer?