[mems-talk] Annealing of Ti-Ag-thin films on Si

[Miyakawa, Natsuki]

Dear all,
I want to do PVD of Ti (~10nm, as adhesive layer) and Ag (~100-200nm) on
Si consecutively. Could anyone suggest me annealing parameters for
adhesion enhancement? The surface should remain pure silver afterwards
(no oxide etc.), so should I anneal the samples under N2-atmosphere?
Should Ti and Ag be annealed separately under different conditions?
Many thanks!

Best regards
Natsuki Miyakawa