[mems-talk] Resist residue removal

[cal Bear]

Hi,
I have fabricated SiO2 rectangular block on top of carbon surface.
This was done by RIE etching the SiO2 and using the photoresist as the mask.
After removing the resist, I find some sort of thin layer of something 
(resist residue?) on carbon surface at the carbon-SiO2 interface.

I am not sure what this is.
I am wondering if anyone has seen this themselves and if so  how I can 
remove it.

I thought about putting the wafer in Tepla and blasting with oxygen..but 
then this would remove the carbon as well...

Thanks in advance...

Mike

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