[mems-talk] Re: Mask for ICP (dry etching)

[Arti Tibrewala]

Hi Everybody,

I am looking for a suitable mask for ICP (dry etching) process. I normally 
use map1275 (7.5 um thick) photoresist from Microresist.
Problem with this photoresist is that I have adhesion problems on silicon di 
oxide. I do use HMDS adhesion layer, but that doesn't help.
I spoke to microresist engineer and she told me problem is probably humidity 
is my cleanroom is too high. Unfortunately I cannot change that. Hence I am 
looking for other thick photoresist, which is less sensitive to humidity or 
any other material.

Could anybody help?

Arti Tibrewala