[mems-talk] Re: Mask for ICP (dry etching)

[Isaac Chan]

Arti,

Can you do a quick bake above 100C then cool it down with N2 gun and spin
coat HMDS immediately?

Isaac


On Thu, 28 Jun 2007, Arti Tibrewala wrote:

> Hi Everybody,
>
> I am looking for a suitable mask for ICP (dry etching) process. I normally
> use map1275 (7.5 um thick) photoresist from Microresist.
> Problem with this photoresist is that I have adhesion problems on silicon di
> oxide. I do use HMDS adhesion layer, but that doesn't help.
> I spoke to microresist engineer and she told me problem is probably humidity
> is my cleanroom is too high. Unfortunately I cannot change that. Hence I am
> looking for other thick photoresist, which is less sensitive to humidity or
> any other material.