[mems-talk] Re: Mask for ICP (dry etching)

[Bill Moffat]

Isaac is nearly right.  The trick is to stop any chance of moisture
before the HMDS is applied.  Easiest way is vacuum/hot Nitrogen
dehydration followed by HMDS vapor while the product is still in a
vacuum dehydration chamber.
Bill Moffat, CEO 
Yield Engineering Systems, Inc. 
203-A Lawrence Drive, Livermore, CA  94551-5152
(925) 373-8353

bmoffat at yieldengineering.com

www.yieldengineering.com


-----Original Message-----
From: mems-talk-bounces at memsnet.org
[mailto:mems-talk-bounces at memsnet.org] On Behalf Of Isaac Chan
Sent: Thursday, June 28, 2007 7:57 AM
To: Arti Tibrewala; General MEMS discussion
Subject: Re: [mems-talk] Re: Mask for ICP (dry etching)

Arti,

Can you do a quick bake above 100C then cool it down with N2 gun and
spin coat HMDS immediately?

Isaac