[mems-talk] Broadened SU-8 pattern

Peng Li (Paul) lip at egr.uri.edu
Fri Mar 30 10:33:06 EST 2007


Dear friends,

I am using SU-8 to do the molding. Every time after UV exposure, I get a
broadened pattern than the photomask. 200um wide photomask will probably
result in a 400um wide channel. It's terrible. I doubt that is because the
light source we are using. It's not parallel light. Can anybody recommend
a parallel light source? Or, there is other possible reasons for the
broadened pattern. What are the solutions?
Thanks!

Peng



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