[mems-talk] Quartz Etching

Gareth Jenkins gjenkins at f2s.com
Thu May 17 17:50:13 EDT 2007


I think you mean HMDS? Yes it will help. Also ensure you dehydrate your 
quartz thoroughly before coating (~220C for 30mins or so).
A Cr/Au layer is also commonly used as an additional etch barrier.

Sreemanth M Uppuluri wrote:
> Hello All,
>
> I am interested in etching quartz using photoresist as the mask. From 
> a reference I found that BHF etches quartz at high speed and does not 
> affect Shipley series photoresist. But when I did perform the etch I 
> found that the photoresist has all been removed by the BHF solution. 
> Can you please let me know what is going wrong. I am presently not 
> using PDMS adhesive layer before coating photoresist on quartz. Could 
> this be a reason?




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