[mems-talk] Developer for AZ9260

[Yue Mun Pun, Jeffrey]

Hi,
I am trying to pattern gold metal lines (100microns width) via lift-off using AZ9260 resist.  The gold thickness is about 600nm.  After spiining the AZ9260 at about 2400rpm for 60s, I discovered that the resist is about 7-8micorns thick, which is sufficiently thick for the lift-off process.
May I know which developer is recommended?  I use AZ400K Developer :DI water in the ration of 1:4 for 8-9 mins and found that this works but the timing is very critical because a shorter time results in resist remaining and a longer time than this causes my patterns to be lifted off in the development process.
 
Any comments are appreciated.
 
Jeffrey