[mems-talk] Precision of film deposition 10 A

[memser]

Hello all,
     I designed an optical modulator based on a film structure. But the requirement of precision of film deposition (PECVD, Oxford plasma system 100)  is approximately 10 A.  It means a deposition time of 1.5 second for PECVD amorphous silicon. I don't know whether this requirment is too difficult to achieve. Maybe subtle changes in chamber of plasma system will lead a disabled device, although we measure the film deposition rate every time before fabriction.

Best regards!

X.Yan
memser at tom.com