[mems-talk] Photoresist as etch mask!

[Xiaoguang Liu]

May I ask why do you have to use PR as a mask?

On 10/1/07, Nitin Shukla <nitin_cs at yahoo.com> wrote:
> Hi,
>   I would appreciate if anyone could suggest me a photoresist that would not be etched by TMAH or KOH.
>


-- 
Xiaoguang "Leo" Liu
Birck Nanotechnology Center,
Purdue University,
1205 W.State Street, West Lafayette, IN, 47906 USA
liu79 at purdue.edu