[mems-talk] Photoresist as etch mask! (Nitin Shukla)

[Wilfried Noell]

Hello,

....and SiC is basically insoluble in KOH. A couple of hundred nm is OK 
for a full wafer etch.

Regards
Wilfried

Frank Yaghmaie wrote:
> ... Negative tone resists such as SU8 or KMPR have some advantage over 
> positive tone resist for your application, yet for wet  Silicon etch, 
> you may want to consider a hard mask, preferably Silicon-Nitride ( 
> Si3N4) or Silicon-Oxide ( Thermal SiO2) ....