[mems-talk] fudging/spreading around the PR features

[Andrea Mazzolari]

Hello,
please specify all the process conditions (substrate, primer, soft bake
temperature and time etc...)

Andrea

> I am new to Photolithography. I am doing Photolithography with S1813.
> Many a times I get fudging/spreading of photoresist around the edge of
> the photoresist features after developing. They look more or less like
> threads spreading outward from the feature.
> Does anyone know what am I doing wrong?