[mems-talk] Question about lift-off positive photoresist which is put there for long time

[luhao]

Hi,
According to the datasheet, we'd better not use acetone to dissolve LOR.  Better use remover 1165.

Hao 
Xiaoyuan Lou wrote:
> Hi, all
> 
> I have a sample with photoresist on which is put aside for quite a long time
> (say half a year). The photoresist is "lift-off photoresist LOR-10B" and
> "positive photoresist S1813".
> 
> After I sputtered ZrO2 on it, I can not lift them off by acetone or develop. It
> looks like too strong. Does anyone here know why? Does long time storage cause
> any problem?
> 
> How can I dissolve this? should I use stronger solvent?