[mems-talk] Re: get a thin oxadation layer

[Ning Wu (nwu at Princeton.EDU)]

You use E-beam to evaporate an thin oxide layer.  I doubt about the use of hydrogen peroxide because it probably won't give you layer thick enough as you required.  

Ning Wu
The Department of Chemical Engineering
Princeton University
New Jersey 08544

  
----- Original Message -----
>From  	"memser" <memser at tom.com>
Date  	Tue, 30 Oct 2007 21:26:57 +0800
To  	"mems-talk at memsnet.org" <mems-talk at memsnet.org>
Subject  	[mems-talk] get a thin oxadation layer

Hello all,
       I'd like to get  a thin oxadation layer (100-500A) on the surface of my structure, but  thermal oxidation is forbidden for its high temperature (lower than 300 ¡ãC is OK).  Now, I want to dip the whole wafer into hydrogen peroxide (H2O2)  or put it into oven (120 ¡ãC) for a while.   Are these method available?   If not, is there any other methods to achieve such a thin oxadation layer (100-500A).  Does anyone has experience to to this? Thanks a lot.

Best wishes!
X.Yan
memser at tom.com