Hi all, i need to make etch of germanium. As etchant i plan to use HNA solution. Here are the steps: 1) deposition of 100nm Cr mask 2) deposition of photoresist s1813 and patterning 3) etch Cr (???) 4) Germanium etch (HNA). could someone give me suggestions about a proper etchant which will etch Cr layer without attack s1813 ? Best regards, Andrea