[mems-talk] Cr etch rate in HF

[Sreemanth M Uppuluri]

Hello All,

I found in literature that Cr is resistant to HF etching. But I find during 
my experiments that Cr film is very easily getting removed when placed in 
50% HF solution. It looks like Cr film does get etched even for very short 
durations (~ 5 min). Does anyone know why this is happening?

Thanks,
Sreemanth