[mems-talk] Silicon oxide depositon and etch problems

[deepa sree]

  Hello All:
    I am having difficulty in etching a silicon oxide layer that I deposited in a Plasma therm system with Silane and Nitrous oxide. Thickness is about 8000 A. It etches really fast (about 30 seconds) in 5:1 BOE, but doesn’t etch at all in a dry etch system. I am using Oxygen and CHF3 for etching. I have tried various gas ratios, power and pressure settings, but I am not able to etch this layer. I need to use a dry etch for my application. Any suggestions about etch or deposition is appreciated.
     Thanks
  Deepa