[mems-talk] PR is all cracked after the deposition TiW

[Kim Anh Bui]

Good evening,
 
I have a problem when depositing the membrane TiW used for RF MEMS Switch. 
We use sputtering for the deposition and TiW is deposited over a thin film of PMMA. 
After the deposition the photo resist is all cracked. 
I don't know if the temperature is too hot or the pressure we use is not suitable.
 
Can anybody give me some advice?
 
Thank you.
 
Kim-Anh BUI-THI

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