[mems-talk] Problems on lithography exposing small samples on MA/BA 6 Mask and Bond Aligner

[Jesse D Fowler]

You should be able to get a wafer chuck that will hold small samples by 
themselves. I have one, and it's not difficult to expose small samples 
that way. I actually have a chuck with two small valves on it (that look 
like screws) that can adjust the vacuum passages to accommodate multiple 
wafer sizes.

Jesse Fowler



"alim polat" <alimpolat at gmail.com> writes:

Hello, everyone
Recently I found out that conducting photo lithography procedure on
small samples is quite challenging. For example, we have MA/BA 6 Mask
and Bond Aligner in our lab to expose samples with photoresist on
them. However, exposing small samples brings great challenge. I
usually put the small samples on top of a dummy wafer and expose.
Sometimes after finishing exposure the small samples are stuck to the
mask when the wafer holder goes down if the thickness of the samples
is thicker, which also brings damage to the expensive mask. I wonder
if anyone has some good ideas about this tricky problem. I will really
appreciate some good ideas.
Alim Polat, PhD student
Linkoping University
Sweden