AW: [mems-talk] Is it possible to deposit Pt directly on Si/SiO2(PECVD) substrate?

[Miyakawa, Natsuki]

Hello Steven,

According to my experience, sputtered Pt (~200nm) stick rather well on thermal SiO2 (~300nm) without adhesion layer. 

Natsuki

-----Ursprüngliche Nachricht-----
Von: mems-talk-bounces at memsnet.org [mailto:mems-talk-bounces at memsnet.org] Im Auftrag von Steven Yang
Gesendet: Samstag, 16. Februar 2008 10:47
An: mems-talk
Betreff: [mems-talk] Is it possible to deposit Pt directly on Si/SiO2(PECVD) substrate?

Hi, all

Not sure the Pt (sputtering) will stick firmly on the substrate or
not? as normally Ti/Pt is used for the electrode deposit. But I am
going to try Pt directly on Si substrate with PECVD SiO2 (1 or 2 um)
due to machine limitation.


and if possible, will the Pt electrode firm enought to go through some
processes like Piranha, O2 plasma?