[mems-talk] Etching silicon nitride

Bill Moffat BMoffat at yieldengineering.com
Tue Jan 8 11:07:12 EST 2008


Not too many,  why not use CF4 plasma.

Bill Moffat, CEO 
Yield Engineering Systems, Inc. 
203-A Lawrence Drive, Livermore, CA  94551-5152
(925) 373-8353

bmoffat at yieldengineering.com

www.yieldengineering.com


-----Original Message-----
From: mems-talk-bounces at memsnet.org
[mailto:mems-talk-bounces at memsnet.org] On Behalf Of Sandip Agarwal
Sent: Tuesday, January 08, 2008 7:49 AM
To: mems-talk at memsnet.org
Subject: [mems-talk] Etching silicon nitride

I want to pattern silicon nitride by etching with hot phosphoric acid.
What are the photoresists that would withstand these etching conditions?


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