[mems-talk] How to uniformly etch ~0.05 - 0.3um off a 3" Si wafer?

[abdou sar]

Hi Dave,

a possible way of doing that is repeating plasma oxidation cycle followed by an  wet etching with a dilueted HCl solution. Therefore you are etching layer of about 0.5 nm per cycle, it is a bit fastidious but  the uniformity is great and the RMS identical to the initial one.
 
Cheers,
 
Abdou.